Hot papers at 2009 VLSI Technology Symposium
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Monday, June 15, 2009
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Hot papers from this year's VLSI Technology Symposium include three nonvolatile memory advancements: Toshiba' BiCS Flash, Samsung's vertical-stacked transistor structures and Hitachi's PCRAM. Two papers on advanced logic processes include: Intel's" High-k/Metal Gate Stacks" and IBM's "32nm SOI CMOS with Highk/ Metal Gate."
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